Personal profile
Expertise related to UN Sustainable Development Goals
In 2015, UN member states agreed to 17 global Sustainable Development Goals (SDGs) to end poverty, protect the planet and ensure prosperity for all. This person’s work contributes towards the following SDG(s):
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SDG 7 Affordable and Clean Energy
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SDG 9 Industry, Innovation, and Infrastructure
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SDG 13 Climate Action
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Dive into the research topics where Jeong Hwan Han is active. These topic labels come from the works of this person. Together they form a unique fingerprint.
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Collaborations and top research areas from the last five years
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Carrier concentration control and thermoelectric enhancement of n-type Bi2Te3-based materials via atomic-layer-deposited In2O3 interfacial layers
Park, G. M., Jeon, J. H., Ju, J., Kim, J. S., Baek, S. H., Han, J. H. & Kim, S. K., Jul 2026, In: Journal of the European Ceramic Society. 46, 7, 118121.Research output: Contribution to journal › Article › peer-review
1 Scopus citations -
Interfacial oxygen-scavenging-driven formation of atomic-layer-deposited MoO2on MoNxelectrodes for improved TiO2capacitor performance
Kang, W., Lee, J. H. & Han, J. H., 4 Mar 2026, In: Journal of Materials Chemistry C. 14, 9, p. 3587-3596 10 p.Research output: Contribution to journal › Article › peer-review
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Inhibitor-Assisted Atomic Layer Deposition for Uniformly Doped Ultrathin Films: Overcoming Compositional and Thickness Limitations
Kim, T., Kim, H., Ryu, S. H., Park, G. M., Kim, S. C., Lee, S. K., Chung, T. M., Won, S. O., Han, J. H., Kim, S. & Kim, S. K., 28 Jan 2025, In: Chemistry of Materials. 37, 2, p. 796-805 10 p.Research output: Contribution to journal › Article › peer-review
3 Scopus citations -
Low-resistivity and high-density molybdenum carbonitride films grown by plasma-enhanced atomic layer deposition
Ahn, J. S., Kang, W. & Han, J. H., Apr 2025, In: Ceramics International. 51, 9, p. 12138-12144 7 p.Research output: Contribution to journal › Article › peer-review
1 Scopus citations -
Plasma-enhanced atomic layer deposition of indium-free ZnSnOx thin films for thin-film transistors
Ryu, S. H., Hwang, I., Jeon, D., Lee, S. K., Chung, T. M., Han, J. H., Chae, S., Baek, I. H. & Kim, S. K., 30 Jan 2025, In: Applied Surface Science. 680, 161320.Research output: Contribution to journal › Article › peer-review
Open Access4 Scopus citations