박막트랜지스터의 병렬형 가역과 비가역 문턱전압 이동에 대한 모델링

Translated title of the contribution: Modeling of Reversible and Irreversible Threshold Voltage Shift in Thin-film Transistors

Research output: Contribution to journalArticlepeer-review

Abstract

Threshold voltage shift has been observed from many thin-film transistors (TFTs) and the time evolution of the shift can be modeled as the stretched-exponential and -hyperbola function. These analytic models are derived from the kinetic equation for defect-creation or charge-trapping and the equation consists of only reversible reactions. In reality TFT's a shift is permanent due to an irreversible reaction and, as a result, it is reasonable to consider that both reversible and irreversible reactions exist in a TFT. In this paper the case when both reactions exist in parallel and make a combined threshold voltage shift is modeled and simulated. The results show that a combined threshold voltage shift observed from a TFT may agrees with the analytic models and, thus, the analytic models don't guarantee whether the cause of the shift is defection-creation or charge-trapping.
Translated title of the contributionModeling of Reversible and Irreversible Threshold Voltage Shift in Thin-film Transistors
Original languageKorean
Pages (from-to)387-393
Number of pages7
Journal전기전자재료학회논문지
Volume29
Issue number7
DOIs
StatePublished - Jul 2016

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