원자층 증착법을 통한 Nb-Si계 초내열합금 분말 상의 TiO2 박막 증착 연구

Translated title of the contribution: TiO2 Thin Film Coating on an Nb-Si–Based Superalloy via Atomic Layer Deposition

Research output: Contribution to journalArticlepeer-review

Abstract

Nano-oxide dispersion–strengthened (ODS) superalloys have attracted attention because of their outstanding mechanical reinforcement mechanism. Dispersed oxides increase the material’s strength by preventing grain growth and recrystallization, as well as increasing creep resistance. In this research, atomic layer deposition (ALD) was applied to synthesize an ODS alloy. It is useful to coat conformal thin films even on complex matrix shapes, such as nanorods or powders. We coated an Nb-Si–based superalloy with TiO2 thin film by using rotary-reactor type thermal ALD. TiO2 was grown by controlling the deposition recipe, reactor temperature, N2 flow rate, and rotor speed. We could confirm the formation of uniform TiO2 film on the surface of the superalloy. This process was successfully applied to the synthesis of an ODS alloy, which could be a new field of ALD applications.
Translated title of the contributionTiO2 Thin Film Coating on an Nb-Si–Based Superalloy via Atomic Layer Deposition
Original languageKorean
Pages (from-to)255-262
Number of pages8
Journal한국분말재료학회지
Volume31
Issue number3
DOIs
StatePublished - 2024

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