A 201- and 283-GHz Dual-Band Amplifier in 65-Nm CMOS Adopting Dual-Frequency Gmax-Core With Dual-Band Matching

Dae Woong Park, Byeonghun Yun, Dzuhri Radityo Utomo, Jong Phil Hong, Sang Gug Lee

Research output: Contribution to journalArticlepeer-review

6 Scopus citations

Abstract

This work reports a concurrent dual-band amplifier with an extensive spacing between the two bands by adopting a proposed dual-frequency maximum achievable gain (Gmax) core with dual-band matching. The proposed dual-frequency Gmax-core can expand the difference between the two target frequencies by focusing on satisfying dominant gain-boosting condition and adopting a linear, lossy, and reciprocal-based design approach. Implemented in a 65-nm complementary metal-oxide-semiconductor (CMOS) process, a five-stage dual-band amplifier shows a peak power gain of 23.6 and 13.7 dB, 3 dB bandwidth of 5 and 17 GHz, saturated output power (Psat) of -1.2 and -2.2 dBm, and peak power-added efficiency of 2.1 and 1.5 % at 201 and 283 GHz, respectively, while consuming a dc power of 34.5 mW. The proposed amplifier is the first demonstration of the concurrent dual-band amplifier operating at G- (140-220 GHz) and H- (220-325 GHz) bands.

Original languageEnglish
Pages (from-to)221-230
Number of pages10
JournalIEEE Transactions on Terahertz Science and Technology
Volume13
Issue number3
DOIs
StatePublished - 1 May 2023

Keywords

  • Amplifier
  • complementary metal-oxide-semiconductor (CMOS)
  • dual-band
  • dual-frequency
  • gain-boosting
  • maximum achievable gain (G)
  • multiband
  • terahertz

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