@inproceedings{0d9fca26f46044bf853db5b6d50a830b,
title = "A Study on the large size AMOLED Display Backplane less mask process",
abstract = "In this work, the large AMOLED Display Backplane LTPS 5Mask PA method was studied. A storage cap was formed by doping boron on the poly Si under the GI cap in the contact hole process without using a storage cap doping mask. In the contact hole process, half-tone PR was used to simultaneously perform cap doping and TFT Source drain open. Since half-tone PR must remain uniform to protect the cap lead-in end with GI uniformly within 8G Glass, photolithography PR process conditions with good half-tone uniformity were set up.",
keywords = "Half-tone PR, Less mask, Storage cap doping",
author = "Chung, \{In Young\} and Guanghai Jin and Hyunsik Yoon",
note = "Publisher Copyright: {\textcopyright} 2023 FTFMD.; 30th International Workshop on Active-Matrix Flatpanel Displays and Devices: TFT Technologies and FPD Materials, AM-FPD 2023 ; Conference date: 04-07-2023 Through 07-07-2023",
year = "2023",
language = "English",
series = "30th International Workshop on Active-Matrix Flatpanel Displays and Devices: TFT Technologies and FPD Materials, AM-FPD 2023 - Proceedings",
publisher = "Institute of Electrical and Electronics Engineers Inc.",
pages = "206--209",
booktitle = "30th International Workshop on Active-Matrix Flatpanel Displays and Devices",
}