AlGaN-based ternary nitride memristors

Seok Choi, Ha Young Lee, Hee Ju Yun, Byung Joon Choi

Research output: Contribution to journalArticlepeer-review

3 Scopus citations

Abstract

Resistive switching memory or memristors have been extensively studied worldwide, driven by perspective applications in nonvolatile memory, processing-in-memory, and neuromorphic computing hardware. Binary oxides are the most prevalent memristive materials; however, non-oxide materials can also exhibit resistive switching. In this study, ternary nitride alloy memristors were fabricated using AlGaN films and were investigated. AlGaN memristors exhibit highly linear and repeatable resistive switching characteristics. Structural and chemical analyses indicate a plausible mechanism of the conduction channel formation in the ternary nitride memristors.

Original languageEnglish
Article number660
JournalApplied Physics A: Materials Science and Processing
Volume127
Issue number9
DOIs
StatePublished - Sep 2021

Keywords

  • AlGaN
  • Atomic layer deposition
  • Memristors
  • Resistive switching memory
  • Ternary nitride

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