Analysis of a 3-DOF rotationally symmetric hinge

  • Hyo Young Kim
  • , Jung Jae Kim
  • , Da Hoon Ahn
  • , Dae Gab Gweon
  • , Chan Gon Park
  • , Dong Pyo Hong

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

Flexure hinges have been widely used as mechanisms for high precision positioning stages that have a micrometer or nanometer resolution. This paper describes the analysis of a 3-DOF rotationally symmetric hinge for the vertical mask aligner stage. The vertical mask aligner stage was designed to overcome the bending of masks by gravity. In order to align the mask and the wafer, the vertical mask aligner stage has one linear motion and yaw rotating motions (Z, Θx, Θy). The new vertical mask aligner stage will try to use rotationally symmetric hinges. These rotationally symmetric hinges would act as guide mechanisms. However, the exact 6-DOF stiffness analysis of the rotationally symmetric hinge did not use these hinges as guide mechanisms. Therefore, this paper focuses on the stiffness analysis of the rotationally symmetric hinges.

Original languageEnglish
Title of host publicationInnovation for Applied Science and Technology
Pages597-600
Number of pages4
DOIs
StatePublished - 2013
Event2nd International Conference on Engineering and Technology Innovation 2012, ICETI 2012 - Kaohsiung, Taiwan, Province of China
Duration: 2 Nov 20126 Nov 2012

Publication series

NameApplied Mechanics and Materials
Volume284-287
ISSN (Print)1660-9336
ISSN (Electronic)1662-7482

Conference

Conference2nd International Conference on Engineering and Technology Innovation 2012, ICETI 2012
Country/TerritoryTaiwan, Province of China
CityKaohsiung
Period2/11/126/11/12

Keywords

  • Compliance
  • Flexure
  • Hinge
  • Mask aligner
  • Precision stage

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