Analysis on Fully Depleted Negative Capacitance Field-Effect Transistor (NCFET) Based on Electrostatic Potential Difference

Kitae Lee, Junil Lee, Sihyun Kim, Soyoun Kim, Munhyeon Kim, Sangwan Kim, Byung Gook Park

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

7 Scopus citations

Abstract

Negative capacitance (NC) has been utilized for steep switching devices. For an accurate anticipation of a device operation, it is needed to understand the mechanism of NC effect in NC-based metal-oxide-semiconductor field-effect transistors (MOSFETs); NCFETs. In this work, NC effect of ferroelectric gate stack has been studied in an aspect of potential change by using technology computer-aided design (TCAD) simulation. In addition, a significance of determining appropriate ferroelectric layer thickness is discussed with the help of transfer characteristics.

Original languageEnglish
Title of host publication2019 Electron Devices Technology and Manufacturing Conference, EDTM 2019
PublisherInstitute of Electrical and Electronics Engineers Inc.
Pages422-424
Number of pages3
ISBN (Electronic)9781538665084
DOIs
StatePublished - Mar 2019
Event2019 Electron Devices Technology and Manufacturing Conference, EDTM 2019 - Singapore, Singapore
Duration: 12 Mar 201915 Mar 2019

Publication series

Name2019 Electron Devices Technology and Manufacturing Conference, EDTM 2019

Conference

Conference2019 Electron Devices Technology and Manufacturing Conference, EDTM 2019
Country/TerritorySingapore
CitySingapore
Period12/03/1915/03/19

Keywords

  • CMOS
  • ferroelectric material
  • low power device
  • NCFET
  • negative capacitance

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