Analysis on the phase transition behavior of Cu base bulk metallic glass by electrical resistivity measurement

  • Young Su Ji
  • , Sung Jae Chung
  • , Myoung Ryul Ok
  • , Kyung Tae Hong
  • , Jin Yoo Suh
  • , Jai Won Byeon
  • , Jin Kook Yoon
  • , Kyung Hwan Lee
  • , Kyung Sub Lee

Research output: Contribution to journalArticlepeer-review

16 Scopus citations

Abstract

The crystallization behavior of Cu43Zr43Al7Ag7 (numbers indicate at.%) bulk metallic glass was investigated using the isothermal electrical resistivity measurements at 450 °C in the supercooled liquid region. The crystallization process is a single step phase transformation. To analyze the electrical resistivity reduction, microstructure evolutions were analyzed using differential scanning calorimetry, X-ray diffraction, transmission electron microscopy and small-angle X-ray scattering. The Avrami parameter of the electrical resistivity reduction step was 1.73, indicating that the crystallization process is a diffusion-controlled growth of intermetallic compounds with decreasing nucleation rate.

Original languageEnglish
Pages (from-to)521-525
Number of pages5
JournalMaterials Science and Engineering: A
Volume448-451
DOIs
StatePublished - 25 Mar 2007

Keywords

  • Annealing
  • Crystallization
  • Electrical resistivity
  • Metallic glass

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