Abstract
Struvite precipitation was applied to the removal of NH4-N in semiconductor wastewater. Batch experiments were conducted to examine the effects of final pH, magnesium and orthophosphate dosages and the initial influent concentrations of NH4-N and F on the removals of NH4-N and PO4-P by forming struvite deposits. pH was an important parameter in the simultaneous removals of ammonium nitrogen and orthophosphate. In struvite precipitation, the amount of orthophosphate in the solution affected NH4-N removal much more than that of magnesium ions in some cases. It was revealed that the low and high initial concentrations of NH4-N and F inhibited NH4-N and PO4-P removal efficiencies in struvite precipitation, respectively. We also evaluated field-scale treatment plant incorporated by struvite precipitation process. On semiconductor wastewater with an NH4-N concentration of 155 mg/L, the results obtained showed that the incorporation of the struvite precipitation process brought about a high NH4-N removal efficiency of over 89% on average.
| Original language | English |
|---|---|
| Pages (from-to) | 163-169 |
| Number of pages | 7 |
| Journal | Journal of Hazardous Materials |
| Volume | 156 |
| Issue number | 1-3 |
| DOIs | |
| State | Published - 15 Aug 2008 |
UN SDGs
This output contributes to the following UN Sustainable Development Goals (SDGs)
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SDG 6 Clean Water and Sanitation
Keywords
- Ammonium nitrogen removal
- Fluoride
- Orthophosphate removal
- Semiconductor wastewater
- Struvite
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