Bonding characterization of oxidized PDMS thin films

J. J. McMahon, Y. Kwon, J. Q. Lu, T. S. Cale, R. J. Gutmann

Research output: Contribution to journalConference articlepeer-review

5 Scopus citations

Abstract

This paper reports on the use of poly(dimethylsiloxane) (PDMS) thin films to bond pairs of glass slides, borosilicate glass, and silicon substrates, with an emphasis on application for wafer-level three-dimensional (3D) heterogeneous integration technology platforms. PDMS films were spin-cast and cured, surface modified using low power oxygen plasma, and then bonded to various materials. These bonds were destructively tested using a four point bending technique. The critical adhesion energy obtained using surface modified PDMS to bond glass slides is 3.0 J/m2. Adhesion energies obtained using unmodified PDMS are 2.8, 1.8, and 1.6 J/m2 for bonded silicon, glass slides, and borosilicate glass, respectively. Correlation of these results to material surface and interface properties indicates that although PDMS has process advantages as a bonding material for heterogeneous integration, its adhesion strength is lower than that of other dielectric bonding glues.

Original languageEnglish
Pages (from-to)99-104
Number of pages6
JournalMaterials Research Society Symposium - Proceedings
Volume795
DOIs
StatePublished - 2003
EventThin Films - Stresses and Mechanical Properties X - Boston, MA., United States
Duration: 1 Dec 20035 Dec 2003

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