TY - JOUR
T1 - Capacitance-voltage (C-V) characteristics of Cu/n-type InP schottky diodes
AU - Kim, Hogyoung
N1 - Publisher Copyright:
© 2016 KIEEME. All rights reserved.
PY - 2016/10
Y1 - 2016/10
N2 - Using capacitance-voltage (C-V) and conductance-voltage (G/ω-V) measurements, the electrical properties of Cu/ n-InP Schottky diodes were investigated. The values of C and G/ω were found to decrease with increasing frequency. The presence of interface states might cause excess capacitance, leading to frequency dispersion. The negative capacitance was observed under a forward bias voltage, which may be due to contact injection, interface states or minority-carrier injection. The barrier heights from C-V measurements were found to depend on the frequency. In particular, the barrier height at 200 kHz was found to be 0.65 eV, which was similar to the flat band barrier height of 0.66 eV.
AB - Using capacitance-voltage (C-V) and conductance-voltage (G/ω-V) measurements, the electrical properties of Cu/ n-InP Schottky diodes were investigated. The values of C and G/ω were found to decrease with increasing frequency. The presence of interface states might cause excess capacitance, leading to frequency dispersion. The negative capacitance was observed under a forward bias voltage, which may be due to contact injection, interface states or minority-carrier injection. The barrier heights from C-V measurements were found to depend on the frequency. In particular, the barrier height at 200 kHz was found to be 0.65 eV, which was similar to the flat band barrier height of 0.66 eV.
KW - Capacitance
KW - InP
KW - Interface states
UR - https://www.scopus.com/pages/publications/84992381835
U2 - 10.4313/TEEM.2016.17.5.293
DO - 10.4313/TEEM.2016.17.5.293
M3 - Article
AN - SCOPUS:84992381835
SN - 1229-7607
VL - 17
SP - 293
EP - 296
JO - Transactions on Electrical and Electronic Materials
JF - Transactions on Electrical and Electronic Materials
IS - 5
ER -