Cause and prevention of moisture-induced degradation of resistance random access memory nanodevices

Dielectric thin films in nanodevices may absorb moisture, leading to physical changes and property/performance degradation, such as altered data storage and readout in resistance random access memory. Here we demonstrate using a nanometallic memory that such degradation proceeds via nanoporosity, which facilitates water wetting in otherwise nonwetting dielectrics. Electric degradation only occurs when the device is in the charge-storage state, which provides a nanoscale dielectrophoretic force directing H₂O to internal field centers (sites of trapped charge) to enable bond rupture and charged hydroxyl formation. While these processes are dramatically enhanced by an external DC or AC field and electron-donating electrodes, they can be completely prevented by eliminating nanoporosity, depositing a barrier layer, or using an oxidation-resistant electrode. These findings provide insight for understanding high-performance memory and field-assisted degradation of nanodevices.