TY - JOUR
T1 - Characterization of the die-attach process via low-temperature reduction of Cu formate in air
AU - Choi, Woo Lim
AU - Kim, Young Sung
AU - Lee, Ki Seong
AU - Lee, Jong Hyun
N1 - Publisher Copyright:
© 2019, Springer Science+Business Media, LLC, part of Springer Nature.
PY - 2019/5/30
Y1 - 2019/5/30
N2 - For sinter-bonding wide-bandgap power devices to Cu finished metals in air, a low-cost material, i.e., a Cu complex paste containing mechanochemically synthesized Cu(II) formate, was prepared. Characteristics of the die-attach process were analyzed with respect to the bonding conditions. Cu nanoparticles were formed in situ by the reduction of Cu(II) formate during heating for the attachment. Sinter-bonding between the nanoparticles and Cu metallization was accelerated by the exothermic heat generated by the Cu complex. As a result, high-speed bonding (1–3 min) was achieved, which prevented severe oxidation of the reduced Cu particles and Cu finish even in air. With the application of an external pressure of 20 MPa, the Cu chips were bonded in only 1 min at 225 °C with a resulting shear strength of 23 MPa. Although the pressure decreased to 13 MPa, bonding occurred within 3 min at 225 and 210 °C, with excellent shear strength exceeding 71 and 39 MPa, respectively.
AB - For sinter-bonding wide-bandgap power devices to Cu finished metals in air, a low-cost material, i.e., a Cu complex paste containing mechanochemically synthesized Cu(II) formate, was prepared. Characteristics of the die-attach process were analyzed with respect to the bonding conditions. Cu nanoparticles were formed in situ by the reduction of Cu(II) formate during heating for the attachment. Sinter-bonding between the nanoparticles and Cu metallization was accelerated by the exothermic heat generated by the Cu complex. As a result, high-speed bonding (1–3 min) was achieved, which prevented severe oxidation of the reduced Cu particles and Cu finish even in air. With the application of an external pressure of 20 MPa, the Cu chips were bonded in only 1 min at 225 °C with a resulting shear strength of 23 MPa. Although the pressure decreased to 13 MPa, bonding occurred within 3 min at 225 and 210 °C, with excellent shear strength exceeding 71 and 39 MPa, respectively.
UR - http://www.scopus.com/inward/record.url?scp=85064702927&partnerID=8YFLogxK
U2 - 10.1007/s10854-019-01317-w
DO - 10.1007/s10854-019-01317-w
M3 - Article
AN - SCOPUS:85064702927
SN - 0957-4522
VL - 30
SP - 9806
EP - 9813
JO - Journal of Materials Science: Materials in Electronics
JF - Journal of Materials Science: Materials in Electronics
IS - 10
ER -