Abstract
Heavily tellurium (Te)-doped InGaP layers in tunnel junctions (TJs) grown by using metalorganic chemical vapor deposition (MOCVD) were investigated to improve the device performance of InGaP/InGaAs/Ge triple-junction solar cells. Three different doping techniques were employed to grow the Te-doped InGaP layers in the TJ; Te doping, Te and Si co-doping and Te pre-doping. Compared to other samples, the external quantum efficiency (EQE) profiles in the InGaP top cell were found to be higher for the sample with Te pre-doping. Under a concentrated light condition, higher fill factor (FF) and conversion efficiency were also observed for the sample with Te pre-doping. These indicate that the crystalline qualities of the upper TJ, composed of a p-GaAs/n-InGaP TJ, and the InGaP top cell were improved by using the Te pre-doping method.
| Original language | English |
|---|---|
| Pages (from-to) | 792-796 |
| Number of pages | 5 |
| Journal | Journal of the Korean Physical Society |
| Volume | 68 |
| Issue number | 6 |
| DOIs | |
| State | Published - 1 Mar 2016 |
Keywords
- Conversion efficiency
- Pre-doping
- Tellurium
- Tunnel junction