Comparative investigation of InGaP/InGaAs/Ge triple-junction solar cells using different Te-doped InGaP layers in tunnel junctions

  • Sang Hyun Jung
  • , Chang Zoo Kim
  • , Youngjo Kim
  • , Dong Hwan Jun
  • , Ho Kwan Kang
  • , Hogyoung Kim

Research output: Contribution to journalArticlepeer-review

5 Scopus citations

Abstract

Heavily tellurium (Te)-doped InGaP layers in tunnel junctions (TJs) grown by using metalorganic chemical vapor deposition (MOCVD) were investigated to improve the device performance of InGaP/InGaAs/Ge triple-junction solar cells. Three different doping techniques were employed to grow the Te-doped InGaP layers in the TJ; Te doping, Te and Si co-doping and Te pre-doping. Compared to other samples, the external quantum efficiency (EQE) profiles in the InGaP top cell were found to be higher for the sample with Te pre-doping. Under a concentrated light condition, higher fill factor (FF) and conversion efficiency were also observed for the sample with Te pre-doping. These indicate that the crystalline qualities of the upper TJ, composed of a p-GaAs/n-InGaP TJ, and the InGaP top cell were improved by using the Te pre-doping method.

Original languageEnglish
Pages (from-to)792-796
Number of pages5
JournalJournal of the Korean Physical Society
Volume68
Issue number6
DOIs
StatePublished - 1 Mar 2016

Keywords

  • Conversion efficiency
  • Pre-doping
  • Tellurium
  • Tunnel junction

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