Abstract
We demonstrate the continuous fabrication of large-area flexible metamaterial films via roll-to-roll (R2R) nanoimprint lithography (NIL) technique that can be conducted in an ambient environment at high speed. The plasmonic metal-insulator-metal structure is successfully fabricated by R2R NIL to continuously pattern the sub-wavelength scale metal disk array on flexible substrates. The patterned metal disks having varying diameters and sub-micron spacing with few defects lead to the desired broadband IR filtering performance at the designed dual-band, which correlates well with simulation analysis. Our method realizes a simple and high-throughput fabrication of plasmonic metamaterials for scalable and flexible optoelectronic and photonic applications.
Original language | English |
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Article number | 223102 |
Journal | Applied Physics Letters |
Volume | 101 |
Issue number | 22 |
DOIs | |
State | Published - 26 Nov 2012 |