Continuous patterning of nanogratings by nanochannel-guided lithography on liquid resists

Jong G. Ok; Hui Joon Park; Moon Kyu Kwak; Carlos A. Pina-Hernandez; Se Hyun Ahn; L. Jay Guo

doi:10.1002/adma.201102199

Continuous patterning of nanogratings by nanochannel-guided lithography on liquid resists

Jong G. Ok, Hui Joon Park, Moon Kyu Kwak, Carlos A. Pina-Hernandez, Se Hyun Ahn, L. Jay Guo

Dept. of Mechanical & Automotive Engineering

Research output: Contribution to journal › Article › peer-review

24 Scopus citations

Abstract

A nanochannel-guided lithography technique is developed that achieves continuous fabrication of higher aspect-ratio nanograting structures by adopting a cross-linkable liquid resist coating. Under the guidance of nanochannels in the grating mold, the UV-curable liquid resist is smoothly extruded and self-stabilized along the slightly inscribed solid substrate, dictated by the resist wettability to the substrate as well as the substrate topography.

Original language	English
Pages (from-to)	4444-4448
Number of pages	5
Journal	Advanced Materials
Volume	23
Issue number	38
DOIs	https://doi.org/10.1002/adma.201102199
State	Published - 11 Oct 2011

Keywords

capillary lithography
nanoimprinting
nanopatterning
surface modification
UV-curable polymeric materials

UN SDGs

This output contributes to the following UN Sustainable Development Goals (SDGs)

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10.1002/adma.201102199

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title = "Continuous patterning of nanogratings by nanochannel-guided lithography on liquid resists",

abstract = "A nanochannel-guided lithography technique is developed that achieves continuous fabrication of higher aspect-ratio nanograting structures by adopting a cross-linkable liquid resist coating. Under the guidance of nanochannels in the grating mold, the UV-curable liquid resist is smoothly extruded and self-stabilized along the slightly inscribed solid substrate, dictated by the resist wettability to the substrate as well as the substrate topography.",

keywords = "capillary lithography, nanoimprinting, nanopatterning, surface modification, UV-curable polymeric materials",

author = "Ok, \{Jong G.\} and Park, \{Hui Joon\} and Kwak, \{Moon Kyu\} and Pina-Hernandez, \{Carlos A.\} and Ahn, \{Se Hyun\} and Guo, \{L. Jay\}",

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doi = "10.1002/adma.201102199",

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T1 - Continuous patterning of nanogratings by nanochannel-guided lithography on liquid resists

AU - Ok, Jong G.

AU - Park, Hui Joon

AU - Kwak, Moon Kyu

AU - Pina-Hernandez, Carlos A.

AU - Ahn, Se Hyun

AU - Guo, L. Jay

PY - 2011/10/11

Y1 - 2011/10/11

N2 - A nanochannel-guided lithography technique is developed that achieves continuous fabrication of higher aspect-ratio nanograting structures by adopting a cross-linkable liquid resist coating. Under the guidance of nanochannels in the grating mold, the UV-curable liquid resist is smoothly extruded and self-stabilized along the slightly inscribed solid substrate, dictated by the resist wettability to the substrate as well as the substrate topography.

AB - A nanochannel-guided lithography technique is developed that achieves continuous fabrication of higher aspect-ratio nanograting structures by adopting a cross-linkable liquid resist coating. Under the guidance of nanochannels in the grating mold, the UV-curable liquid resist is smoothly extruded and self-stabilized along the slightly inscribed solid substrate, dictated by the resist wettability to the substrate as well as the substrate topography.

KW - capillary lithography

KW - nanoimprinting

KW - nanopatterning

KW - surface modification

KW - UV-curable polymeric materials

UR - https://www.scopus.com/pages/publications/80053476530

U2 - 10.1002/adma.201102199

DO - 10.1002/adma.201102199

M3 - Article

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AN - SCOPUS:80053476530

SN - 0935-9648

VL - 23

SP - 4444

EP - 4448

JO - Advanced Materials

JF - Advanced Materials

IS - 38

ER -

Continuous patterning of nanogratings by nanochannel-guided lithography on liquid resists

Abstract

Keywords

UN SDGs

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