Abstract
We investigate the deposition properties of a focused ion beam for the fabrication of metal structures. We performed experiments under various beam currents, deposition times, and initial design diameters and analyzed the fabricated diameters and heights with recorded video clips. We observed abnormal deposition phenomena which show the etching effect as well as deposition, and investigated the relationship between the etching and parameters such as beam current and designed diameter. We apply these conditions and finally fabricate a high-aspect-ratio tip without abnormal deposition phenomena.
| Original language | English |
|---|---|
| Pages (from-to) | 363-370 |
| Number of pages | 8 |
| Journal | Microsystem Technologies |
| Volume | 19 |
| Issue number | 3 |
| DOIs | |
| State | Published - Mar 2013 |