TY - JOUR
T1 - Design and characterization of microelectromechanical system flow sensors using silicon nanowires
AU - Lou, Liang
AU - Lee, Chengkuo
AU - Xu, Xiangguo
AU - Kotlanka, Rama Krishna
AU - Shao, Lichun
AU - Park, Woo Tae
AU - Kwong, D. L.
PY - 2011/4
Y1 - 2011/4
N2 - Cantilever structures were reported to be used for flow sensing purposes. Herein, we present silicon nanowire (SiNW) based cantilever flow sensor. Five cantilever flow sensors with different depths are modeled and simulated (fluid-structure) with water flow velocity from 50 cm/s to 200 cm/s. SiNW is embedded in the cantilever as piezoresistive transducer at the anchor, and a maximum resistance change of 11.2% is obtained. Based on the results, increasing depth will not only contributes to larger cantilever deformation at fixed flow velocity, but also improves its sensitivity. However when the depth become larger to certain degree, this effect tends to saturate.
AB - Cantilever structures were reported to be used for flow sensing purposes. Herein, we present silicon nanowire (SiNW) based cantilever flow sensor. Five cantilever flow sensors with different depths are modeled and simulated (fluid-structure) with water flow velocity from 50 cm/s to 200 cm/s. SiNW is embedded in the cantilever as piezoresistive transducer at the anchor, and a maximum resistance change of 11.2% is obtained. Based on the results, increasing depth will not only contributes to larger cantilever deformation at fixed flow velocity, but also improves its sensitivity. However when the depth become larger to certain degree, this effect tends to saturate.
KW - Flow sensor
KW - MEMS
KW - Silicon nanowire
UR - https://www.scopus.com/pages/publications/79952715149
U2 - 10.1166/nnl.2011.1160
DO - 10.1166/nnl.2011.1160
M3 - Article
AN - SCOPUS:79952715149
SN - 1941-4900
VL - 3
SP - 230
EP - 234
JO - Nanoscience and Nanotechnology Letters
JF - Nanoscience and Nanotechnology Letters
IS - 2
ER -