@inproceedings{83fdf6165e084b27ac2aa833ed3b54b2,
title = "Experimental and numerical analysis of polymer deformation in thermal nanoimprint lithography",
abstract = "Nanoimprint lithography has been widely used in various applications as a promising micro/nano fabrication tool. In the thermal nanoimprint process, optimization of important process parameters such as temperature, pressure, and pressure holding time is greatly needed to successfully imprint micro- and nano-scale patterns in a resist material. In this study, both experimentation and numerical simulation were performed to extend the understanding of the behaviour of polymer materials and to optimize process condition effectively during the thermal imprint process. The effects of the process conditions on the polymer deformation are discussed to achieve a rapid and high throughput thermal imprint process.",
keywords = "Finite element analysis, Nanoimprint, PMMA, Polymer, Viscoelastic",
author = "Shin, \{Ki Hoon\} and Park, \{Hee Su\} and Kim, \{Hong Seok\}",
year = "2012",
doi = "10.4028/www.scientific.net/KEM.516.269",
language = "English",
isbn = "9783037854280",
series = "Key Engineering Materials",
publisher = "Trans Tech Publications Ltd",
pages = "269--274",
booktitle = "Proceedings of Precision Engineering and Nanotechnology",
note = "4th International Conference of Asian Society for Precision Engineering and Nanotechnology, ASPEN 2011 ; Conference date: 16-11-2011 Through 18-11-2011",
}
