TY - GEN
T1 - Experimental characterization of TSV liquid cooling for 3D integration
AU - Park, Manseok
AU - Kim, Sungdong
AU - Kim, Sarah Eunkyung
N1 - Publisher Copyright:
© 2015 IEEE.
PY - 2015/11/10
Y1 - 2015/11/10
N2 - The development of 3D integration causes the major technology paradigm shift to all of IC devices, interconnects, and packages. Despite the benefits of 3D integration, it faces a key challenge of thermal management, especially for high power and high density devices. Due to the limitation of conventional thermal solutions, a liquid cooling method is of great interest. In this study the direct liquid cooling module with different TSVs and microchannel has been designed and fabricated. Pressure drop and temperature differential of liquid cooling module were investigated experimentally.
AB - The development of 3D integration causes the major technology paradigm shift to all of IC devices, interconnects, and packages. Despite the benefits of 3D integration, it faces a key challenge of thermal management, especially for high power and high density devices. Due to the limitation of conventional thermal solutions, a liquid cooling method is of great interest. In this study the direct liquid cooling module with different TSVs and microchannel has been designed and fabricated. Pressure drop and temperature differential of liquid cooling module were investigated experimentally.
KW - Decision support systems
KW - Liquid cooling
KW - Microchannels
KW - Thermal management
KW - Three-dimensional displays
KW - Through-silicon vias
UR - https://www.scopus.com/pages/publications/84961875071
U2 - 10.1109/IITC-MAM.2015.7325660
DO - 10.1109/IITC-MAM.2015.7325660
M3 - Conference contribution
AN - SCOPUS:84961875071
T3 - 2015 IEEE International Interconnect Technology Conference and 2015 IEEE Materials for Advanced Metallization Conference, IITC/MAM 2015
SP - 241
EP - 243
BT - 2015 IEEE International Interconnect Technology Conference and 2015 IEEE Materials for Advanced Metallization Conference, IITC/MAM 2015
PB - Institute of Electrical and Electronics Engineers Inc.
T2 - IEEE International Interconnect Technology Conference and 2015 IEEE Materials for Advanced Metallization Conference, IITC/MAM 2015
Y2 - 18 May 2015 through 21 May 2015
ER -