Abstract
Well-distributed ruthenium (Ru) nanoparticles decorated on porous carbon nanofibers (CNFs) were synthesized using an electrospinning method and a reduction method for use in high-performance elctrochemical capacitors. The formation mechanisms including structural, morphological, and chemical bonding properties are demonstrated by means of field emission scanning electron microscopy (FESEM), transmission electron microscopy (TEM), X-ray diffraction (XRD), and X-ray photoelectron spectroscopy (XPS). To investigate the optimum amount of the Ru nanoparticles decorated on the porous CNFs, we controlled three different weight ratios (0 wt%, 20 wt%, and 40 wt%) of the Ru nanoparticles on the porous CNFs. For the case of 20 wt% Ru nanoparticles decorated on the porous CNFs, TEM results indicate that the Ru nanoparticles with ̃2-4 nm size are uniformly distributed on the porous CNFs. In addition, 40 wt% Ru nanoparticles decorated on the porous CNFs exhibit agglomerated Ru nanoparticles, which causes low performance of electrodes in electrochemical capacitors. Thus, proper distribution of 20 wt% Ru nanoparticles decorated on the porous CNFs presents superior specific capacitance (̃280.5 F/g at 10 mV/s) as compared to the 40 wt% Ru nanoparticles decorated on the porous CNFs and the only porous CNFs. This enhancement can be attributed to the synergistic effects of well-distributed Ru nanoparticles and porous CNF supports having high surface area.
| Original language | English |
|---|---|
| Pages (from-to) | 37-42 |
| Number of pages | 6 |
| Journal | Korean Journal of Materials Research |
| Volume | 24 |
| Issue number | 1 |
| DOIs | |
| State | Published - Jan 2014 |
Keywords
- Electrochemical capacitors
- Electrospinning
- Porous carbon nanofibers
- Reduction method
- Ruthenium(Ru) nanoparticles
Fingerprint
Dive into the research topics of 'Fabrication of ru nanoparticles decorated porous carbon nanofibers for electrochemical capacitors'. Together they form a unique fingerprint.Cite this
- APA
- Author
- BIBTEX
- Harvard
- Standard
- RIS
- Vancouver