Facet-Mediated Growth of High-Quality Monolayer Graphene on Arbitrarily Rough Copper Surfaces

Hyo Chan Lee; Sae Byeok Jo; Eunho Lee; Min Seok Yoo; Hyun Ho Kim; Seong Kyu Lee; Wi Hyoung Lee; Kilwon Cho

doi:10.1002/adma.201504190

Facet-Mediated Growth of High-Quality Monolayer Graphene on Arbitrarily Rough Copper Surfaces

Hyo Chan Lee, Sae Byeok Jo, Eunho Lee, Min Seok Yoo, Hyun Ho Kim, Seong Kyu Lee, Wi Hyoung Lee, Kilwon Cho

Dept. of Chemical and Biomolecular Engineering

Research output: Contribution to journal › Article › peer-review

35 Scopus citations

Original language	English
Pages (from-to)	2010-2017
Number of pages	8
Journal	Advanced Materials
Volume	28
Issue number	10
DOIs	https://doi.org/10.1002/adma.201504190
State	Published - Mar 2016

Keywords

chemical vapor deposition
copper surfaces
faceting
graphene

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10.1002/adma.201504190

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@article{a65d56d7bcf74c0fa56ed12521dbaaa1,

title = "Facet-Mediated Growth of High-Quality Monolayer Graphene on Arbitrarily Rough Copper Surfaces",

keywords = "chemical vapor deposition, copper surfaces, faceting, graphene",

author = "Lee, {Hyo Chan} and Jo, {Sae Byeok} and Eunho Lee and Yoo, {Min Seok} and Kim, {Hyun Ho} and Lee, {Seong Kyu} and Lee, {Wi Hyoung} and Kilwon Cho",

year = "2016",

month = mar,

doi = "10.1002/adma.201504190",

language = "English",

volume = "28",

pages = "2010--2017",

journal = "Advanced Materials",

issn = "0935-9648",

number = "10",

}

TY - JOUR

T1 - Facet-Mediated Growth of High-Quality Monolayer Graphene on Arbitrarily Rough Copper Surfaces

AU - Lee, Hyo Chan

AU - Jo, Sae Byeok

AU - Lee, Eunho

AU - Yoo, Min Seok

AU - Kim, Hyun Ho

AU - Lee, Seong Kyu

AU - Lee, Wi Hyoung

AU - Cho, Kilwon

PY - 2016/3

Y1 - 2016/3

KW - chemical vapor deposition

KW - copper surfaces

KW - faceting

KW - graphene

UR - http://www.scopus.com/inward/record.url?scp=84954348816&partnerID=8YFLogxK

U2 - 10.1002/adma.201504190

DO - 10.1002/adma.201504190

M3 - Article

AN - SCOPUS:84954348816

SN - 0935-9648

VL - 28

SP - 2010

EP - 2017

JO - Advanced Materials

JF - Advanced Materials

IS - 10

ER -

Facet-Mediated Growth of High-Quality Monolayer Graphene on Arbitrarily Rough Copper Surfaces

Keywords

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