Field emission from GaN and (Al,Ga) NGaN nanorod heterostructures

Parijat Deb, Tyler Westover, Hogyoung Kim, Timothy Fisher, Timothy Sands

Research output: Contribution to journalArticlepeer-review

11 Scopus citations

Abstract

Vacuum field emission from GaN and (Al,Ga) NGaN nanorods with pyramidal tips has been measured. The turn-on fields, defined at a current density of 0.1 μA cm2, were found to be 38.7 and 19.3 Vμm, for unintentionally doped GaN and (Al,Ga) NGaN nanorods, respectively. The 5 nm (Al,Ga)N layer reduced the electron affinity at the surface, thereby lowering the turn-on field and increasing the current density. The nanostructures exhibit a field enhancement factor of approximately 65 and the work function of the (Al,Ga) NGaN nanorod heterostructure was estimated to be 2.1 eV. The stability of the emission characteristics and the simple fabrication method suggest that intentionally doped and optimized (Al,Ga) NGaN nanorod heterostructures may prove suitable for field-emission device.

Original languageEnglish
Pages (from-to)15-18
Number of pages4
JournalJournal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Volume25
Issue number3
DOIs
StatePublished - 2007

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