Abstract
The demand for fine-pitch devices is increasing due to an increase in I/O pin count, a reduction in power consumption, and a miniaturization of chip and package. In addition non-scalability of Cu pillar/Sn cap or Pb-free solder structure for fine-pitch interconnection leads to the development of bumpless interconnection system. Few bumpless interconnect systems such as BBUL technology, SAB technology, SAM technology, Cu-toCu thermocompression technology, and WOW's bumpless technology using an adhesive have been reviewed in this paper: The key requirements for Cu bumpless technology are the planarization, contamination-free surface, and surface activation.
Translated title of the contribution | Bumpless Interconnect System for Fine-pitch Devices |
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Original language | Korean |
Pages (from-to) | 1-6 |
Number of pages | 6 |
Journal | 마이크로전자 및 패키징학회지 |
Volume | 21 |
Issue number | 3 |
DOIs | |
State | Published - Sep 2014 |