Force-calibrated AFM for mechanical test of freestanding thin films

Hak Joo Lee; Ki Ho Cho; Jae Hyun Kim; Seung Woo Han; Byung Ik Choi; Chang Wook Baek; Jong Man Kim; Sung Hoon Choa

doi:10.4028/0-87849-978-4.275

Force-calibrated AFM for mechanical test of freestanding thin films

Hak Joo Lee, Ki Ho Cho, Jae Hyun Kim, Seung Woo Han, Byung Ik Choi, Chang Wook Baek, Jong Man Kim, Sung Hoon Choa

Dept. of Semiconductor Engineering

Research output: Contribution to journal › Article › peer-review

4 Scopus citations

Abstract

Atomic force microscope (AFM) is a powerful tool for exploring a nano-scale world. It can measure a nano-scale surface topography with very high resolution and detect a very small force. In this paper, we propose a novel AFM cantilever and its calibration scheme to utilize AFM as a mechanical testing machine. We call this AFM with a new cantilever as a force-calibrated AFM. The feasibility of the AFM cantilever is validated through measurement of mechanical properties of freestanding Au thin films.

Original language	English
Pages (from-to)	275-279
Number of pages	5
Journal	Key Engineering Materials
Volume	297-300 I
DOIs	https://doi.org/10.4028/0-87849-978-4.275
State	Published - 2005

Keywords

AFM (Atomic Force Microscope)
Au
Calibration
Cantilever
Freestanding thin film
Mechanical test

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10.4028/0-87849-978-4.275

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title = "Force-calibrated AFM for mechanical test of freestanding thin films",

abstract = "Atomic force microscope (AFM) is a powerful tool for exploring a nano-scale world. It can measure a nano-scale surface topography with very high resolution and detect a very small force. In this paper, we propose a novel AFM cantilever and its calibration scheme to utilize AFM as a mechanical testing machine. We call this AFM with a new cantilever as a force-calibrated AFM. The feasibility of the AFM cantilever is validated through measurement of mechanical properties of freestanding Au thin films.",

keywords = "AFM (Atomic Force Microscope), Au, Calibration, Cantilever, Freestanding thin film, Mechanical test",

author = "Lee, \{Hak Joo\} and Cho, \{Ki Ho\} and Kim, \{Jae Hyun\} and Han, \{Seung Woo\} and Choi, \{Byung Ik\} and Baek, \{Chang Wook\} and Kim, \{Jong Man\} and Choa, \{Sung Hoon\}",

year = "2005",

doi = "10.4028/0-87849-978-4.275",

language = "English",

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pages = "275--279",

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T1 - Force-calibrated AFM for mechanical test of freestanding thin films

AU - Lee, Hak Joo

AU - Cho, Ki Ho

AU - Kim, Jae Hyun

AU - Han, Seung Woo

AU - Choi, Byung Ik

AU - Baek, Chang Wook

AU - Kim, Jong Man

AU - Choa, Sung Hoon

PY - 2005

Y1 - 2005

N2 - Atomic force microscope (AFM) is a powerful tool for exploring a nano-scale world. It can measure a nano-scale surface topography with very high resolution and detect a very small force. In this paper, we propose a novel AFM cantilever and its calibration scheme to utilize AFM as a mechanical testing machine. We call this AFM with a new cantilever as a force-calibrated AFM. The feasibility of the AFM cantilever is validated through measurement of mechanical properties of freestanding Au thin films.

AB - Atomic force microscope (AFM) is a powerful tool for exploring a nano-scale world. It can measure a nano-scale surface topography with very high resolution and detect a very small force. In this paper, we propose a novel AFM cantilever and its calibration scheme to utilize AFM as a mechanical testing machine. We call this AFM with a new cantilever as a force-calibrated AFM. The feasibility of the AFM cantilever is validated through measurement of mechanical properties of freestanding Au thin films.

KW - AFM (Atomic Force Microscope)

KW - Au

KW - Calibration

KW - Cantilever

KW - Freestanding thin film

KW - Mechanical test

UR - https://www.scopus.com/pages/publications/33750122327

U2 - 10.4028/0-87849-978-4.275

DO - 10.4028/0-87849-978-4.275

M3 - Article

AN - SCOPUS:33750122327

SN - 1013-9826

VL - 297-300 I

SP - 275

EP - 279

JO - Key Engineering Materials

JF - Key Engineering Materials

ER -

Force-calibrated AFM for mechanical test of freestanding thin films

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Keywords

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