Formation of MoSi 2 layer by hydrogen reduction and Si-pack cementation

In Mok Jeon; Jong Min Byun; Se Hoon Kim; Jin Woo Kim; Young Do Kim

doi:10.3365/KJMM.2012.50.9.653

Formation of MoSi ₂ layer by hydrogen reduction and Si-pack cementation

In Mok Jeon
, Jong Min Byun
, Se Hoon Kim
, Jin Woo Kim
, Young Do Kim

Dept. of Materials Science & Engineering

Hanyang University

Research output: Contribution to journal › Article › peer-review

Abstract

In this study, a molybdenum disilicide (MoSi ₂) coating process was investigated by hydrogen reduction and Si-pack cementation. At first, the metallic Mo coating was carried out by hydrogen reduction of MoO ₃ powder at 750°C for various holding times (1, 2, 3 h) in hydrogen atmosphere. A 4.3μm thick metallic molybdenum thin film was formed at 3h. MoSi ₂ was obtained by Si-pack cementation on molybdenum thin film through hydrogen reduction processing. It was carried out using Si: Al ₂O ₃: NH ₄Cl = 5 : 92 : 3 (wt%) packs at 900°C for various holding times (30, 60, 90 min) in Ar atmosphere. When the holding time was 90 min, a MoSi ₂ layer was coated successfully and a 15.4 μm thickness was observed.

Original language	English
Pages (from-to)	653-657
Number of pages	5
Journal	Journal of Korean Institute of Metals and Materials
Volume	50
Issue number	9
DOIs	https://doi.org/10.3365/KJMM.2012.50.9.653
State	Published - Sep 2012

Keywords

Coating
Diffusion
Hydrogen reduction
Scanning electron microscopy (SEM)
Thin films

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10.3365/KJMM.2012.50.9.653

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title = "Formation of MoSi 2 layer by hydrogen reduction and Si-pack cementation",

abstract = "In this study, a molybdenum disilicide (MoSi 2) coating process was investigated by hydrogen reduction and Si-pack cementation. At first, the metallic Mo coating was carried out by hydrogen reduction of MoO 3 powder at 750°C for various holding times (1, 2, 3 h) in hydrogen atmosphere. A 4.3μm thick metallic molybdenum thin film was formed at 3h. MoSi 2 was obtained by Si-pack cementation on molybdenum thin film through hydrogen reduction processing. It was carried out using Si: Al 2O 3: NH 4Cl = 5 : 92 : 3 (wt\%) packs at 900°C for various holding times (30, 60, 90 min) in Ar atmosphere. When the holding time was 90 min, a MoSi 2 layer was coated successfully and a 15.4 μm thickness was observed.",

keywords = "Coating, Diffusion, Hydrogen reduction, Scanning electron microscopy (SEM), Thin films",

author = "Jeon, \{In Mok\} and Byun, \{Jong Min\} and Kim, \{Se Hoon\} and Kim, \{Jin Woo\} and Kim, \{Young Do\}",

year = "2012",

month = sep,

doi = "10.3365/KJMM.2012.50.9.653",

language = "English",

volume = "50",

pages = "653--657",

journal = "Journal of Korean Institute of Metals and Materials",

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TY - JOUR

T1 - Formation of MoSi 2 layer by hydrogen reduction and Si-pack cementation

AU - Jeon, In Mok

AU - Byun, Jong Min

AU - Kim, Se Hoon

AU - Kim, Jin Woo

AU - Kim, Young Do

PY - 2012/9

Y1 - 2012/9

N2 - In this study, a molybdenum disilicide (MoSi 2) coating process was investigated by hydrogen reduction and Si-pack cementation. At first, the metallic Mo coating was carried out by hydrogen reduction of MoO 3 powder at 750°C for various holding times (1, 2, 3 h) in hydrogen atmosphere. A 4.3μm thick metallic molybdenum thin film was formed at 3h. MoSi 2 was obtained by Si-pack cementation on molybdenum thin film through hydrogen reduction processing. It was carried out using Si: Al 2O 3: NH 4Cl = 5 : 92 : 3 (wt%) packs at 900°C for various holding times (30, 60, 90 min) in Ar atmosphere. When the holding time was 90 min, a MoSi 2 layer was coated successfully and a 15.4 μm thickness was observed.

AB - In this study, a molybdenum disilicide (MoSi 2) coating process was investigated by hydrogen reduction and Si-pack cementation. At first, the metallic Mo coating was carried out by hydrogen reduction of MoO 3 powder at 750°C for various holding times (1, 2, 3 h) in hydrogen atmosphere. A 4.3μm thick metallic molybdenum thin film was formed at 3h. MoSi 2 was obtained by Si-pack cementation on molybdenum thin film through hydrogen reduction processing. It was carried out using Si: Al 2O 3: NH 4Cl = 5 : 92 : 3 (wt%) packs at 900°C for various holding times (30, 60, 90 min) in Ar atmosphere. When the holding time was 90 min, a MoSi 2 layer was coated successfully and a 15.4 μm thickness was observed.

KW - Coating

KW - Diffusion

KW - Hydrogen reduction

KW - Scanning electron microscopy (SEM)

KW - Thin films

UR - https://www.scopus.com/pages/publications/84866922129

U2 - 10.3365/KJMM.2012.50.9.653

DO - 10.3365/KJMM.2012.50.9.653

M3 - Article

AN - SCOPUS:84866922129

SN - 1738-8228

VL - 50

SP - 653

EP - 657

JO - Journal of Korean Institute of Metals and Materials

JF - Journal of Korean Institute of Metals and Materials

IS - 9

ER -

Formation of MoSi ₂ layer by hydrogen reduction and Si-pack cementation

Abstract

Keywords

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