Generation of high-quality lines and arrays using nanoparticle controlling processes

Seung H. Huh; Doh H. Riu; Y. Naono; Y. Taguchi; S. Kawabata; A. Nakajima

doi:10.1063/1.2778464

Generation of high-quality lines and arrays using nanoparticle controlling processes

Seung H. Huh, Doh H. Riu, Y. Naono, Y. Taguchi, S. Kawabata, A. Nakajima

Dept. of Materials Science & Engineering

Research output: Contribution to journal › Article › peer-review

9 Scopus citations

Abstract

Highly reliable lines and arrays comprising the smallest metallic nanoparticles (NPs) were produced by using a combination of techniques such as lithography, lift-off, size selection, aerosol deposition, and NP colloids. The narrowest 80 nm Au lines were produced by the deposition of only 4 nm Au NPs, driven by two factors-NP kinetics and collision-induced surface melting. An array of unsupported free 30-100 Ni NPs and one of 20-40 nm Ni NPs supported in holes were produced by the principles of hole-size-induced filtering and the binding of thiol groups.

Original language	English
Article number	093118
Journal	Applied Physics Letters
Volume	91
Issue number	9
DOIs	https://doi.org/10.1063/1.2778464
State	Published - 2007

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title = "Generation of high-quality lines and arrays using nanoparticle controlling processes",

abstract = "Highly reliable lines and arrays comprising the smallest metallic nanoparticles (NPs) were produced by using a combination of techniques such as lithography, lift-off, size selection, aerosol deposition, and NP colloids. The narrowest 80 nm Au lines were produced by the deposition of only 4 nm Au NPs, driven by two factors-NP kinetics and collision-induced surface melting. An array of unsupported free 30-100 Ni NPs and one of 20-40 nm Ni NPs supported in holes were produced by the principles of hole-size-induced filtering and the binding of thiol groups.",

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AU - Huh, Seung H.

AU - Riu, Doh H.

AU - Naono, Y.

AU - Taguchi, Y.

AU - Kawabata, S.

AU - Nakajima, A.

PY - 2007

Y1 - 2007

N2 - Highly reliable lines and arrays comprising the smallest metallic nanoparticles (NPs) were produced by using a combination of techniques such as lithography, lift-off, size selection, aerosol deposition, and NP colloids. The narrowest 80 nm Au lines were produced by the deposition of only 4 nm Au NPs, driven by two factors-NP kinetics and collision-induced surface melting. An array of unsupported free 30-100 Ni NPs and one of 20-40 nm Ni NPs supported in holes were produced by the principles of hole-size-induced filtering and the binding of thiol groups.

AB - Highly reliable lines and arrays comprising the smallest metallic nanoparticles (NPs) were produced by using a combination of techniques such as lithography, lift-off, size selection, aerosol deposition, and NP colloids. The narrowest 80 nm Au lines were produced by the deposition of only 4 nm Au NPs, driven by two factors-NP kinetics and collision-induced surface melting. An array of unsupported free 30-100 Ni NPs and one of 20-40 nm Ni NPs supported in holes were produced by the principles of hole-size-induced filtering and the binding of thiol groups.

UR - https://www.scopus.com/pages/publications/34548445928

U2 - 10.1063/1.2778464

DO - 10.1063/1.2778464

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SN - 0003-6951

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JO - Applied Physics Letters

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Generation of high-quality lines and arrays using nanoparticle controlling processes

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