Growth of metal-free carbon nanotubes with an amorphous carbon catalyst layer

Woochang Song; Dong Gun Lim; Hee Dong Kim; Jae Hyeoung Lee; Jaesang Cha; Gooman Park; Eun Chang Choi; Hyun Suk Hwang; Hyung Jun Cho; Byungyou Hong; Won Seok Choi

doi:10.3938/jkps.53.2142

Growth of metal-free carbon nanotubes with an amorphous carbon catalyst layer

Woochang Song
, Dong Gun Lim
, Hee Dong Kim
, Jae Hyeoung Lee
, Jaesang Cha
, Gooman Park
, Eun Chang Choi
, Hyun Suk Hwang
, Hyung Jun Cho
, Byungyou Hong
, Won Seok Choi

Media IT Engineering Program

Research output: Contribution to journal › Article › peer-review

2 Scopus citations

Abstract

An amorphous carbon (a-C) thin film was used as a catalyst layer to grow metal-free carbon nanotubes (CNTs). The a-C films were deposited with a closed-field unbalanced magnetron (CFUBM) sputtering method on Si substrates. The CNTs were prepared using a microwave plasma-enhanced chemical-vapor deposition (MPECVD) method with an a-C catalyst film coated onto a silicon substrate by using methane (CH₄) and hydrogen (H₂) gas. The CNTs were grown at different temperatures (550°C, 650°C and 750°C), with other conditions being held constant. Field emission scanning electron microscopy (FE-SEM) images showed growth trend of the CNTs against temperature. High-resolution transmission electron microscopy (HR-TEM) images showed the CNTs to be multi-walled. Energy dispersive spectroscopy (EDS) measurements confirmed that the CNTs consisted solely of carbon.

Original language	English
Pages (from-to)	2142-2146
Number of pages	5
Journal	Journal of the Korean Physical Society
Volume	53
Issue number	4
DOIs	https://doi.org/10.3938/jkps.53.2142
State	Published - Oct 2008

Keywords

Amorphous carbon
Carbon nanotube (CNT)
Catalyst
Closed-field unbalanced magnetron (CFUBM)
Microwave plasma-enhanced chemical-vapor deposition (MPECVD)

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10.3938/jkps.53.2142

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title = "Growth of metal-free carbon nanotubes with an amorphous carbon catalyst layer",

abstract = "An amorphous carbon (a-C) thin film was used as a catalyst layer to grow metal-free carbon nanotubes (CNTs). The a-C films were deposited with a closed-field unbalanced magnetron (CFUBM) sputtering method on Si substrates. The CNTs were prepared using a microwave plasma-enhanced chemical-vapor deposition (MPECVD) method with an a-C catalyst film coated onto a silicon substrate by using methane (CH4) and hydrogen (H2) gas. The CNTs were grown at different temperatures (550°C, 650°C and 750°C), with other conditions being held constant. Field emission scanning electron microscopy (FE-SEM) images showed growth trend of the CNTs against temperature. High-resolution transmission electron microscopy (HR-TEM) images showed the CNTs to be multi-walled. Energy dispersive spectroscopy (EDS) measurements confirmed that the CNTs consisted solely of carbon.",

keywords = "Amorphous carbon, Carbon nanotube (CNT), Catalyst, Closed-field unbalanced magnetron (CFUBM), Microwave plasma-enhanced chemical-vapor deposition (MPECVD)",

author = "Woochang Song and Lim, \{Dong Gun\} and Kim, \{Hee Dong\} and Lee, \{Jae Hyeoung\} and Jaesang Cha and Gooman Park and Choi, \{Eun Chang\} and Hwang, \{Hyun Suk\} and Cho, \{Hyung Jun\} and Byungyou Hong and Choi, \{Won Seok\}",

year = "2008",

month = oct,

doi = "10.3938/jkps.53.2142",

language = "English",

volume = "53",

pages = "2142--2146",

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AU - Song, Woochang

AU - Lim, Dong Gun

AU - Kim, Hee Dong

AU - Lee, Jae Hyeoung

AU - Cha, Jaesang

AU - Park, Gooman

AU - Choi, Eun Chang

AU - Hwang, Hyun Suk

AU - Cho, Hyung Jun

AU - Hong, Byungyou

AU - Choi, Won Seok

PY - 2008/10

Y1 - 2008/10

N2 - An amorphous carbon (a-C) thin film was used as a catalyst layer to grow metal-free carbon nanotubes (CNTs). The a-C films were deposited with a closed-field unbalanced magnetron (CFUBM) sputtering method on Si substrates. The CNTs were prepared using a microwave plasma-enhanced chemical-vapor deposition (MPECVD) method with an a-C catalyst film coated onto a silicon substrate by using methane (CH4) and hydrogen (H2) gas. The CNTs were grown at different temperatures (550°C, 650°C and 750°C), with other conditions being held constant. Field emission scanning electron microscopy (FE-SEM) images showed growth trend of the CNTs against temperature. High-resolution transmission electron microscopy (HR-TEM) images showed the CNTs to be multi-walled. Energy dispersive spectroscopy (EDS) measurements confirmed that the CNTs consisted solely of carbon.

AB - An amorphous carbon (a-C) thin film was used as a catalyst layer to grow metal-free carbon nanotubes (CNTs). The a-C films were deposited with a closed-field unbalanced magnetron (CFUBM) sputtering method on Si substrates. The CNTs were prepared using a microwave plasma-enhanced chemical-vapor deposition (MPECVD) method with an a-C catalyst film coated onto a silicon substrate by using methane (CH4) and hydrogen (H2) gas. The CNTs were grown at different temperatures (550°C, 650°C and 750°C), with other conditions being held constant. Field emission scanning electron microscopy (FE-SEM) images showed growth trend of the CNTs against temperature. High-resolution transmission electron microscopy (HR-TEM) images showed the CNTs to be multi-walled. Energy dispersive spectroscopy (EDS) measurements confirmed that the CNTs consisted solely of carbon.

KW - Amorphous carbon

KW - Carbon nanotube (CNT)

KW - Catalyst

KW - Closed-field unbalanced magnetron (CFUBM)

KW - Microwave plasma-enhanced chemical-vapor deposition (MPECVD)

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U2 - 10.3938/jkps.53.2142

DO - 10.3938/jkps.53.2142

M3 - Article

AN - SCOPUS:55949089694

SN - 0374-4884

VL - 53

SP - 2142

EP - 2146

JO - Journal of the Korean Physical Society

JF - Journal of the Korean Physical Society

IS - 4

ER -

Growth of metal-free carbon nanotubes with an amorphous carbon catalyst layer

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Keywords

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