High-Temperature Atomic Layer Deposition of Rutile TiO2 Films on RuO2 Substrates: Interfacial Reactions and Dielectric Performance

  • Jihoon Jeon
  • , Taikyu Kim
  • , Myoungsu Jang
  • , Hong Keun Chung
  • , Sung Chul Kim
  • , Sung Ok Won
  • , Yongjoo Park
  • , Byung Joon Choi
  • , Yoon Jang Chung
  • , Seong Keun Kim

Research output: Contribution to journal › Article › peer-review

14 Scopus citations

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