High-Temperature Atomic Layer Deposition of Rutile TiO2 Films on RuO2 Substrates: Interfacial Reactions and Dielectric Performance
- Jihoon Jeon
- , Taikyu Kim
- , Myoungsu Jang
- , Hong Keun Chung
- , Sung Chul Kim
- , Sung Ok Won
- , Yongjoo Park
- , Byung Joon Choi
- , Yoon Jang Chung
- , Seong Keun Kim
- Korea Institute of Science and Technology
- Korea University
- Hanyang University
- SK Trichem Co. Ltd.
Research output: Contribution to journal › Article › peer-review
24
Scopus
citations