Homo-junction pn diode using p-type SnO and n-type SnO2 thin films

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Abstract

Tin oxide thin films are of great interest for device applications, but in spite of their good optical transparency and outstanding semiconductor properties, stable p-type tin oxide needs to be developed. In this study both p-type SnO and n-type SnO2 thin films were deposited by reactive rf magnetron sputtering using Sn target in Ar and O2 gas mixture. The structural, electrical, and optical properties of both p-type SnO and n-type SnO2 thin films were analysed. The transparent homo-junction pn diode was also fabricated and it showed a fairly good rectification behavior with a turn-on voltage of 2.3 V.

Original languageEnglish
Pages (from-to)P94-P98
JournalECS Solid State Letters
Volume3
Issue number8
DOIs
StatePublished - 2014

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