Abstract
Tin oxide thin films are of great interest for device applications, but in spite of their good optical transparency and outstanding semiconductor properties, stable p-type tin oxide needs to be developed. In this study both p-type SnO and n-type SnO2 thin films were deposited by reactive rf magnetron sputtering using Sn target in Ar and O2 gas mixture. The structural, electrical, and optical properties of both p-type SnO and n-type SnO2 thin films were analysed. The transparent homo-junction pn diode was also fabricated and it showed a fairly good rectification behavior with a turn-on voltage of 2.3 V.
| Original language | English |
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| Pages (from-to) | P94-P98 |
| Journal | ECS Solid State Letters |
| Volume | 3 |
| Issue number | 8 |
| DOIs | |
| State | Published - 2014 |