Horizontally aligned ALD-SnO films grown on SiO2-passivated high-k HfO2 dielectrics for high-mobility and low-power P-channel thin-film transistor
- Jina Kim
- , Hee Won Jang
- , Myeong Gil Chae
- , Heenang Choi
- , Jeong Eun Shin
- , Bo Keun Park
- , Taek Mo Chung
- , Jeong Hwan Han
- Seoul National University of Science and Technology (SNUST)
- Korea Research Institute of Chemical Technology
Research output: Contribution to journal › Article › peer-review
6
Scopus
citations