TY - JOUR
T1 - Importance of surface modification of a microcontact stamp for pattern fidelity of soluble organic semiconductors
AU - Park, Hea Lim
AU - Lee, Bo Yeon
AU - Kim, Se Um
AU - Suh, Jeng Hun
AU - Kim, Min Hoi
AU - Lee, Sin Doo
N1 - Publisher Copyright:
© 2016 Society of Photo-Optical Instrumentation Engineers (SPIE).
PY - 2016/1/1
Y1 - 2016/1/1
N2 - We described the effect of the ultraviolet ozone (UVO) treatment of a polydimethylsiloxane (PDMS) stamp on the fidelity of 6,13-bis(triisopropylsilylethynyl) pentacene (TIPS-PEN) patterns produced from a TIPS-PEN/polymer blend by selective contact evaporation (SCE). During the SCE process, the TIPS-PEN in contact with the nanoporous PDMS was absorbed into the PDMS stamp, leaving out the TIPS-PEN patterns, complementary to the PDMS patterns, in the noncontact regions. For the case of the untreated, hydrophobic PDMS surface, the TIPS-PEN patterns developed initially were shrunken and eventually disappeared after 24 h due to the steady absorption of the TIPS-PEN in time. In contrast, for the UVO-treated case, the TIPS-PEN patterns were found to maintain the initial shapes over the period of 24 h since the absorption of the TIPS-PEN was limited by the hydrophilic nature of the UVO-treated PDMS. The modified PDMS surface by the UVO for 30 min yielded the highest fidelity of the TIPS-PEN patterns in both height and width. The patterned TIPS-PEN layer by the SCE was implemented into an organic field-effect transistor to demonstrate the viability of the SCE combined with the UVO treatment for solution-processed organic electronic devices.
AB - We described the effect of the ultraviolet ozone (UVO) treatment of a polydimethylsiloxane (PDMS) stamp on the fidelity of 6,13-bis(triisopropylsilylethynyl) pentacene (TIPS-PEN) patterns produced from a TIPS-PEN/polymer blend by selective contact evaporation (SCE). During the SCE process, the TIPS-PEN in contact with the nanoporous PDMS was absorbed into the PDMS stamp, leaving out the TIPS-PEN patterns, complementary to the PDMS patterns, in the noncontact regions. For the case of the untreated, hydrophobic PDMS surface, the TIPS-PEN patterns developed initially were shrunken and eventually disappeared after 24 h due to the steady absorption of the TIPS-PEN in time. In contrast, for the UVO-treated case, the TIPS-PEN patterns were found to maintain the initial shapes over the period of 24 h since the absorption of the TIPS-PEN was limited by the hydrophilic nature of the UVO-treated PDMS. The modified PDMS surface by the UVO for 30 min yielded the highest fidelity of the TIPS-PEN patterns in both height and width. The patterned TIPS-PEN layer by the SCE was implemented into an organic field-effect transistor to demonstrate the viability of the SCE combined with the UVO treatment for solution-processed organic electronic devices.
KW - 6,13-bis(triisopropylsilylethynyl)-pentacene
KW - pattern fidelity
KW - polydimethylsiloxane
KW - selective contact evaporation
KW - solution-processed organic field-effect transistor
KW - ultraviolet ozone treatment
UR - http://www.scopus.com/inward/record.url?scp=84955492782&partnerID=8YFLogxK
U2 - 10.1117/1.JMM.15.1.013501
DO - 10.1117/1.JMM.15.1.013501
M3 - Article
AN - SCOPUS:84955492782
SN - 1932-5150
VL - 15
JO - Journal of Micro/ Nanolithography, MEMS, and MOEMS
JF - Journal of Micro/ Nanolithography, MEMS, and MOEMS
IS - 1
M1 - 013501
ER -