Influence of Current Distribution Variations on Contact Resistance Measurement in Cu-Cu Bonding Interface

Kyoung Min Shin, Jong Kyung Park

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

This paper evaluates the current distribution characteristics in the CBKR(Cross-Bridge-Kelvin-Resistor) structure and SGC (Stacked-Greek-Cross) structure designed to extract contact resistance occurring at the Cu-Cu bonding interfaces. We investigated a method to accurately extract contact resistance using Electromagnetic (EM) simulation. The current distribution varies depending on the thickness of the copper, the direction of current passing through the bonding interface, the interconnect size, and the imposed contact resistivity, which in turn affects the measurement of contact resistance. This result suggests a direction for more accurate measurement of contact resistance.

Original languageEnglish
Title of host publicationProceedings - 19th International Microsystems, Packaging, Assembly and Circuits Technology Conference, IMPACT 2024
PublisherIEEE Computer Society
Pages366-369
Number of pages4
ISBN (Electronic)9798331532246
DOIs
StatePublished - 2024
Event19th International Microsystems, Packaging, Assembly and Circuits Technology Conference, IMPACT 2024 - Taipei, Taiwan, Province of China
Duration: 22 Oct 202425 Oct 2024

Publication series

NameProceedings of Technical Papers - International Microsystems, Packaging, Assembly, and Circuits Technology Conference, IMPACT
ISSN (Print)2150-5934
ISSN (Electronic)2150-5942

Conference

Conference19th International Microsystems, Packaging, Assembly and Circuits Technology Conference, IMPACT 2024
Country/TerritoryTaiwan, Province of China
CityTaipei
Period22/10/2425/10/24

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