TY - JOUR
T1 - Interfacial Trap-based 1-row Hammer Analysis of BCAT and Nitride Layer BCAT Structures in Dynamic Random Access Memory
AU - Lim, Chang Young
AU - Kim, Yeon Seok
AU - Kwon, Min Woo
N1 - Publisher Copyright:
© 2024, Institute of Electronics Engineers of Korea. All rights reserved.
PY - 2024/2/1
Y1 - 2024/2/1
N2 - Dynamic Random Access Memory is critical to computing for its speed and cost-effective capacity. As the demand for high-capacity memory grows, DRAM is being scaled down. However, reduced cell distances cause electrical disturbances between cells, resulting in 1-row hammer. This leads to abnormal operation and security risks. Therefore, 1-row Hammer is a major issue in modern DRAM technology. In this paper, we study the principle and impact of 1-row Hammer in DRAM, with a focus on D0 failures, a type of 1-row Hammer that causes stored data to transition from 0 to 1 due to repeated access. The mechanism involves the electron capture and diffusion of electrons affected by interfacial traps and device structures. To investigate the D0 failure, we reproduced the 1-row hammer using mixed mode to evaluate the effects on the interfacial trap and device structure changes. This research serves to improve understanding of row hammer and suggests a mitigation strategy using nitride layer. The proposed structure improves the D0 failure by about 70%, effectively improving the security vulnerability of DRAM.
AB - Dynamic Random Access Memory is critical to computing for its speed and cost-effective capacity. As the demand for high-capacity memory grows, DRAM is being scaled down. However, reduced cell distances cause electrical disturbances between cells, resulting in 1-row hammer. This leads to abnormal operation and security risks. Therefore, 1-row Hammer is a major issue in modern DRAM technology. In this paper, we study the principle and impact of 1-row Hammer in DRAM, with a focus on D0 failures, a type of 1-row Hammer that causes stored data to transition from 0 to 1 due to repeated access. The mechanism involves the electron capture and diffusion of electrons affected by interfacial traps and device structures. To investigate the D0 failure, we reproduced the 1-row hammer using mixed mode to evaluate the effects on the interfacial trap and device structure changes. This research serves to improve understanding of row hammer and suggests a mitigation strategy using nitride layer. The proposed structure improves the D0 failure by about 70%, effectively improving the security vulnerability of DRAM.
KW - 1-row hammer
KW - D0 failure
KW - Dynamic random access memory
KW - disturbance
KW - interfacial trap
UR - http://www.scopus.com/inward/record.url?scp=85186939054&partnerID=8YFLogxK
U2 - 10.5573/JSTS.2024.24.1.18
DO - 10.5573/JSTS.2024.24.1.18
M3 - Article
AN - SCOPUS:85186939054
SN - 1598-1657
VL - 24
SP - 18
EP - 24
JO - Journal of Semiconductor Technology and Science
JF - Journal of Semiconductor Technology and Science
IS - 1
ER -