Abstract
Accurate estimation of device thickness and instantaneous mobility is essential for reliable characterization and optimization of memristors. Conventional curve-fitting methods, based on idealized physical assumptions, often produce substantial errors, with relative deviations of 10%–25% for thickness and 20%–40% for mobility in nanoscale TiO2 devices. This study presents a noise-resilient and physically interpretable XGBoost regression framework for direct estimation of thickness and instantaneous mobility from TiO2 memristor current–voltage (I-V) data. Evaluated under realistic noise conditions—including shot, thermal, flicker, and quantization noise modeled after a Keysight B1500A analyzer—the framework achieved R2 = 0.9973 for thickness and R2 = 0.9383 for instantaneous mobility, with relative errors (REs) of 1.90% and 18.9%, respectively. Feature-importance analysis identified Ron, Roff, temperature, and predicted thickness as the dominant predictors, aligning with their physical roles in doped-region dynamics and ionic drift. These results demonstrate that the proposed machine learning (ML) framework provides a robust, interpretable, and scalable solution for parameter extraction from noisy I-V measurements, substantially surpassing traditional fitting approaches and enabling reliable device modeling and optimization.
| Original language | English |
|---|---|
| Pages (from-to) | 821-827 |
| Number of pages | 7 |
| Journal | IEEE Transactions on Electron Devices |
| Volume | 73 |
| Issue number | 2 |
| DOIs | |
| State | Published - 2026 |
Keywords
- Machine learning (ML)
- XGBoost
- memristor
- mobility
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