Kinetics of Au-containing ternary intermetallic redeposition at solder/UBM interface

J. H. Lee, J. H. Park, D. H. Shin, Y. H. Lee, Y. S. Kim

Research output: Contribution to journalArticlepeer-review

22 Scopus citations

Abstract

In this study, the effects of the under bump metallurgy (UBM) structure and Cu content in solders on the redeposition rate of Au-containing ternary intermetallics at the solder/UBM interface were investigated. A UBM structure with a Ni diffusion barrier, Au/Ni/Cu, appeared to promote the redeposition of ternary Au-containing intermetallics at the solder/UBM interface of the ternary during the solid-state aging treatment and the Au-embrittlement of the solder interconnections. Copper added to the eutectic Sn-Pb and Sn-Ag solders was observed to be very effective in retarding the redeposition by forming the ternary intermetallics in solder matrices and preventing the Au-embrittlement. These phenomena were discussed with the microstructures observed.

Original languageEnglish
Article number141
Pages (from-to)1138-1144
Number of pages7
JournalJournal of Electronic Materials
Volume30
Issue number9
DOIs
StatePublished - 2001

Keywords

  • Aging treatment
  • Au-containing ternary intermetallic
  • Au-embrittlement
  • Fracture energy
  • Redeposition

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