Abstract
Silicon substrate for light emitting diodes (LEDs) has been the tendency of LED packaging for improving power consumption and light output. In this study, a low cost and high throughput Si through via fabrication has been demonstrated using a wet etching process. Both a wet etching only process and a combination of wet etching and dry etching process were evaluated. The silicon substrate with Si through via fabricated by KOH wet etching showed a good electrical resistance (${\sim}5.5{\Omega}$) of Cu interconnection and a suitable thermal resistance (4 K/W) compared to AlN ceramic substrate.
| Translated title of the contribution | Developing Low Cost, High Throughput Si Through Via Etching for LED Substrate |
|---|---|
| Original language | Korean |
| Pages (from-to) | 19-23 |
| Number of pages | 5 |
| Journal | 마이크로전자 및 패키징학회지 |
| Volume | 19 |
| Issue number | 4 |
| DOIs | |
| State | Published - Dec 2012 |