Magnetoresistance behavior in electroplated and sputtered Bi thin films

M. H. Jeun; K. I. Lee; K. H. Lee; D. Y. Kim; J. Y. Chang; K. H. Shin; S. H. Han; J. G. Ha; W. Y. Lee

doi:10.1016/j.jmmm.2003.12.733

Magnetoresistance behavior in electroplated and sputtered Bi thin films

M. H. Jeun, K. I. Lee, K. H. Lee, D. Y. Kim, J. Y. Chang, K. H. Shin, S. H. Han, J. G. Ha, W. Y. Lee

Dept. of Optometry

Research output: Contribution to journal › Article › peer-review

Abstract

The magnetotransport properties of the electroplated and sputtered Bi thin films have been investigated in the range 4-300K. Both the films are found to exhibit very large MR, ∼600%, at room temperature. The room temperature MR in the sputtered films depends on the grain size, in contrast to the electroplated films.

Original language	English
Pages (from-to)	e1455-e1457
Journal	Journal of Magnetism and Magnetic Materials
Volume	272-276
Issue number	SUPPL. 1
DOIs	https://doi.org/10.1016/j.jmmm.2003.12.733
State	Published - May 2004

Keywords

Magnetotransport
Ordinary magnetoresistance
Spin injection

Access to Document

10.1016/j.jmmm.2003.12.733

Cite this

@article{1b33118e32c64c2d85589f8edf72f24a,

title = "Magnetoresistance behavior in electroplated and sputtered Bi thin films",

abstract = "The magnetotransport properties of the electroplated and sputtered Bi thin films have been investigated in the range 4-300K. Both the films are found to exhibit very large MR, ∼600\%, at room temperature. The room temperature MR in the sputtered films depends on the grain size, in contrast to the electroplated films.",

keywords = "Magnetotransport, Ordinary magnetoresistance, Spin injection",

author = "Jeun, \{M. H.\} and Lee, \{K. I.\} and Lee, \{K. H.\} and Kim, \{D. Y.\} and Chang, \{J. Y.\} and Shin, \{K. H.\} and Han, \{S. H.\} and Ha, \{J. G.\} and Lee, \{W. Y.\}",

year = "2004",

month = may,

doi = "10.1016/j.jmmm.2003.12.733",

language = "English",

volume = "272-276",

pages = "e1455--e1457",

journal = "Journal of Magnetism and Magnetic Materials",

issn = "0304-8853",

number = "SUPPL. 1",

}

TY - JOUR

T1 - Magnetoresistance behavior in electroplated and sputtered Bi thin films

AU - Jeun, M. H.

AU - Lee, K. I.

AU - Lee, K. H.

AU - Kim, D. Y.

AU - Chang, J. Y.

AU - Shin, K. H.

AU - Han, S. H.

AU - Ha, J. G.

AU - Lee, W. Y.

PY - 2004/5

Y1 - 2004/5

N2 - The magnetotransport properties of the electroplated and sputtered Bi thin films have been investigated in the range 4-300K. Both the films are found to exhibit very large MR, ∼600%, at room temperature. The room temperature MR in the sputtered films depends on the grain size, in contrast to the electroplated films.

AB - The magnetotransport properties of the electroplated and sputtered Bi thin films have been investigated in the range 4-300K. Both the films are found to exhibit very large MR, ∼600%, at room temperature. The room temperature MR in the sputtered films depends on the grain size, in contrast to the electroplated films.

KW - Magnetotransport

KW - Ordinary magnetoresistance

KW - Spin injection

UR - http://www.scopus.com/inward/record.url?scp=23144441311&partnerID=8YFLogxK

U2 - 10.1016/j.jmmm.2003.12.733

DO - 10.1016/j.jmmm.2003.12.733

M3 - Article

AN - SCOPUS:23144441311

SN - 0304-8853

VL - 272-276

SP - e1455-e1457

JO - Journal of Magnetism and Magnetic Materials

JF - Journal of Magnetism and Magnetic Materials

IS - SUPPL. 1

ER -

Magnetoresistance behavior in electroplated and sputtered Bi thin films

Abstract

Keywords

Access to Document

Other files and links

Fingerprint

Cite this