Magnetoresistance behavior in electroplated and sputtered Bi thin films

M. H. Jeun; K. I. Lee; K. H. Lee; D. Y. Kim; J. Y. Chang; K. H. Shin; S. H. Han; J. G. Ha; W. Y. Lee

doi:10.1016/j.jmmm.2003.12.733

Magnetoresistance behavior in electroplated and sputtered Bi thin films

M. H. Jeun
, K. I. Lee
, K. H. Lee
, D. Y. Kim
, J. Y. Chang
, K. H. Shin
, S. H. Han
, J. G. Ha
, W. Y. Lee

Dept. of Optometry

Research output: Contribution to journal › Article › peer-review

Abstract

The magnetotransport properties of the electroplated and sputtered Bi thin films have been investigated in the range 4-300K. Both the films are found to exhibit very large MR, ∼600%, at room temperature. The room temperature MR in the sputtered films depends on the grain size, in contrast to the electroplated films.

Original language	English
Pages (from-to)	e1455-e1457
Journal	Journal of Magnetism and Magnetic Materials
Volume	272-276
Issue number	SUPPL. 1
DOIs	https://doi.org/10.1016/j.jmmm.2003.12.733
State	Published - May 2004

Keywords

Magnetotransport
Ordinary magnetoresistance
Spin injection

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10.1016/j.jmmm.2003.12.733

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title = "Magnetoresistance behavior in electroplated and sputtered Bi thin films",

abstract = "The magnetotransport properties of the electroplated and sputtered Bi thin films have been investigated in the range 4-300K. Both the films are found to exhibit very large MR, ∼600\%, at room temperature. The room temperature MR in the sputtered films depends on the grain size, in contrast to the electroplated films.",

keywords = "Magnetotransport, Ordinary magnetoresistance, Spin injection",

author = "Jeun, \{M. H.\} and Lee, \{K. I.\} and Lee, \{K. H.\} and Kim, \{D. Y.\} and Chang, \{J. Y.\} and Shin, \{K. H.\} and Han, \{S. H.\} and Ha, \{J. G.\} and Lee, \{W. Y.\}",

year = "2004",

month = may,

doi = "10.1016/j.jmmm.2003.12.733",

language = "English",

volume = "272-276",

pages = "e1455--e1457",

journal = "Journal of Magnetism and Magnetic Materials",

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TY - JOUR

T1 - Magnetoresistance behavior in electroplated and sputtered Bi thin films

AU - Jeun, M. H.

AU - Lee, K. I.

AU - Lee, K. H.

AU - Kim, D. Y.

AU - Chang, J. Y.

AU - Shin, K. H.

AU - Han, S. H.

AU - Ha, J. G.

AU - Lee, W. Y.

PY - 2004/5

Y1 - 2004/5

N2 - The magnetotransport properties of the electroplated and sputtered Bi thin films have been investigated in the range 4-300K. Both the films are found to exhibit very large MR, ∼600%, at room temperature. The room temperature MR in the sputtered films depends on the grain size, in contrast to the electroplated films.

AB - The magnetotransport properties of the electroplated and sputtered Bi thin films have been investigated in the range 4-300K. Both the films are found to exhibit very large MR, ∼600%, at room temperature. The room temperature MR in the sputtered films depends on the grain size, in contrast to the electroplated films.

KW - Magnetotransport

KW - Ordinary magnetoresistance

KW - Spin injection

UR - https://www.scopus.com/pages/publications/23144441311

U2 - 10.1016/j.jmmm.2003.12.733

DO - 10.1016/j.jmmm.2003.12.733

M3 - Article

AN - SCOPUS:23144441311

SN - 0304-8853

VL - 272-276

SP - e1455-e1457

JO - Journal of Magnetism and Magnetic Materials

JF - Journal of Magnetism and Magnetic Materials

IS - SUPPL. 1

ER -

Magnetoresistance behavior in electroplated and sputtered Bi thin films

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Keywords

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