Skip to main navigation Skip to search Skip to main content

Photo-Roll Lithography (PRL) for continuous and scalable patterning with application in flexible electronics

  • Jong G. Ok
  • , Moon Kyu Kwak
  • , Chad M. Huard
  • , Hong Seok Youn
  • , L. Jay Guo
  • University of Michigan, Ann Arbor
  • Kyungpook National University

Research output: Contribution to journalArticlepeer-review

91 Scopus citations

Abstract

A novel nanofabrication methodology for continuous, scalable, and geometry-tunable lithography is developed, named photo-roll lithography (PRL), by integrating photolithography with rollable processing. As a flexible mask attached to a quartz cylinder containing a UV source rolls over a photoresistcoated substrate, PRL realizes continuous photolithographic fabrication of various micro/nanoscale patterns with geometry that is tunable by controlling mask-substrate motions.

Original languageEnglish
Pages (from-to)6554-6561
Number of pages8
JournalAdvanced Materials
Volume25
Issue number45
DOIs
StatePublished - 3 Dec 2013

UN SDGs

This output contributes to the following UN Sustainable Development Goals (SDGs)

  1. SDG 9 - Industry, Innovation, and Infrastructure
    SDG 9 Industry, Innovation, and Infrastructure

Keywords

  • flexible electronics
  • graphene
  • light-emitting diodes
  • nanomanufacturing
  • photolithography
  • roll-to-roll processes
  • spectrum filters
  • transparent conductors

Fingerprint

Dive into the research topics of 'Photo-Roll Lithography (PRL) for continuous and scalable patterning with application in flexible electronics'. Together they form a unique fingerprint.

Cite this