TY - JOUR
T1 - Recent progress on metasurfaces
T2 - applications and fabrication
AU - Yoon, Gwanho
AU - Tanaka, Takuo
AU - Zentgraf, Thomas
AU - Rho, Junsuk
N1 - Publisher Copyright:
© 2021 IOP Publishing Ltd.
PY - 2021/9
Y1 - 2021/9
N2 - Metasurfaces are two-dimensional arrays of subwavelength optical antennas and have possible applications of next-generation optical components such as ultrathin lenses, high-resolution holograms, and optical cloaks. The remaining challenges in the field of metasurfaces involve the development of methods to manufacture those tiny nanostructures on a large scale. There have been many attempts to overcome the limitations of electron beam lithography which is a conventional method to fabricate metasurfaces. This review provides and discusses recent progress on metasurfaces with priority given to their applications and scalable manufacturing methods such as nanoimprint lithography, deep-UV lithography, colloidal lithography, and direct laser writing. These nanofabrication techniques will contribute to the commercialization of metasurfaces.
AB - Metasurfaces are two-dimensional arrays of subwavelength optical antennas and have possible applications of next-generation optical components such as ultrathin lenses, high-resolution holograms, and optical cloaks. The remaining challenges in the field of metasurfaces involve the development of methods to manufacture those tiny nanostructures on a large scale. There have been many attempts to overcome the limitations of electron beam lithography which is a conventional method to fabricate metasurfaces. This review provides and discusses recent progress on metasurfaces with priority given to their applications and scalable manufacturing methods such as nanoimprint lithography, deep-UV lithography, colloidal lithography, and direct laser writing. These nanofabrication techniques will contribute to the commercialization of metasurfaces.
KW - DUV lithography
KW - colloidal lithography
KW - direct laser writing
KW - large-scale nanofabrication
KW - nanoimprint lithography
KW - self-organization
UR - https://www.scopus.com/pages/publications/85111191753
U2 - 10.1088/1361-6463/ac0faa
DO - 10.1088/1361-6463/ac0faa
M3 - Review article
AN - SCOPUS:85111191753
SN - 0022-3727
VL - 54
JO - Journal of Physics D: Applied Physics
JF - Journal of Physics D: Applied Physics
IS - 38
M1 - 383002
ER -