TY - GEN
T1 - RF parametric study on AlGaN/GaN HEMTs on Si-substrate for millimeter-wave PA
AU - Kim, Jihoon
AU - Park, Hongjong
AU - Kim, Donghwan
AU - Lee, Minseong
AU - Seo, Kwangseok
AU - Kwon, Youngwoo
PY - 2013
Y1 - 2013
N2 - Size-optimized AlGaN/GaN HEMTs on Si-substrate are investigated for millimeter-wave power amplifier (PA) MMICs. The number of finger (2, 4, 8) and the unit finger width (25, 37.5, 50, 75, 100 μm) of devices are split in the AlGaN/GaN HEMTs process on Si-substrate. For searching the best suitable size for millimeter-wave PA, the RF performances such as Fmax and MAG (Maximum Available Gain) are investigated through S-parameter measurements and small signal model parameter extractions. Moreover, thermal resistances are extracted through pulsed IV measurement to evaluate thermal degradation on GaN HEMTs. Through these experiments and parametric analyses, 4×37.5 μm or 8 × 37.5 μm GaN HEMTs show the best RF performance keeping not larger thermal resistances (Rth). Thermal resistance and MAG are dependent on the gate pitch of GaN HEMTs. The selection of the proper gate pitch parameter of device is expected to bring the optimal power device performance in the millimeter-wave frequencies.
AB - Size-optimized AlGaN/GaN HEMTs on Si-substrate are investigated for millimeter-wave power amplifier (PA) MMICs. The number of finger (2, 4, 8) and the unit finger width (25, 37.5, 50, 75, 100 μm) of devices are split in the AlGaN/GaN HEMTs process on Si-substrate. For searching the best suitable size for millimeter-wave PA, the RF performances such as Fmax and MAG (Maximum Available Gain) are investigated through S-parameter measurements and small signal model parameter extractions. Moreover, thermal resistances are extracted through pulsed IV measurement to evaluate thermal degradation on GaN HEMTs. Through these experiments and parametric analyses, 4×37.5 μm or 8 × 37.5 μm GaN HEMTs show the best RF performance keeping not larger thermal resistances (Rth). Thermal resistance and MAG are dependent on the gate pitch of GaN HEMTs. The selection of the proper gate pitch parameter of device is expected to bring the optimal power device performance in the millimeter-wave frequencies.
KW - AlGaN/GaN HEMT on Si-substrate
KW - Fmax
KW - MAG
KW - Pulsed IV measurement
KW - gate pitch
KW - millimeter-wave power amplifier
KW - thermal resistance
UR - http://www.scopus.com/inward/record.url?scp=84893369730&partnerID=8YFLogxK
U2 - 10.1109/APMC.2013.6694928
DO - 10.1109/APMC.2013.6694928
M3 - Conference contribution
AN - SCOPUS:84893369730
SN - 9781479914746
T3 - Asia-Pacific Microwave Conference Proceedings, APMC
SP - 775
EP - 777
BT - 2013 Asia-Pacific Microwave Conference Proceedings, APMC 2013
T2 - 2013 3rd Asia-Pacific Microwave Conference, APMC 2013
Y2 - 5 November 2013 through 8 November 2013
ER -