Room-temperature imprint lithography

D. Y. Khang; H. Yoon; H. H. Lee

doi:10.1002/1521-4095(200105)13:10<749::AID-ADMA749>3.0.CO;2-7

Room-temperature imprint lithography

D. Y. Khang, H. Yoon, H. H. Lee

Dept. of Chemical and Biomolecular Engineering

Seoul National University

Research output: Contribution to journal › Article › peer-review

108 Scopus citations

Abstract

A room-temperature imprint lithography based on plastic flow along with free-volume contraction and plastic deformation of the resist layer is demonstrated. In this method, the thermoplastic resist layer is pressed by a mold at room temperature, without heating or any surface treatment of either the mold or the resist. This method has the unique features of enabling step-and-repeat and multiple imprinting.

Original language	English
Pages (from-to)	749-752
Number of pages	4
Journal	Advanced Materials
Volume	13
Issue number	10
DOIs	https://doi.org/10.1002/1521-4095(200105)13:10<749::AID-ADMA749>3.0.CO;2-7
State	Published - 17 May 2001

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10.1002/1521-4095(200105)13:10<749::AID-ADMA749>3.0.CO;2-7

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title = "Room-temperature imprint lithography",

abstract = "A room-temperature imprint lithography based on plastic flow along with free-volume contraction and plastic deformation of the resist layer is demonstrated. In this method, the thermoplastic resist layer is pressed by a mold at room temperature, without heating or any surface treatment of either the mold or the resist. This method has the unique features of enabling step-and-repeat and multiple imprinting.",

author = "Khang, \{D. Y.\} and H. Yoon and Lee, \{H. H.\}",

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AU - Khang, D. Y.

AU - Yoon, H.

AU - Lee, H. H.

PY - 2001/5/17

Y1 - 2001/5/17

N2 - A room-temperature imprint lithography based on plastic flow along with free-volume contraction and plastic deformation of the resist layer is demonstrated. In this method, the thermoplastic resist layer is pressed by a mold at room temperature, without heating or any surface treatment of either the mold or the resist. This method has the unique features of enabling step-and-repeat and multiple imprinting.

AB - A room-temperature imprint lithography based on plastic flow along with free-volume contraction and plastic deformation of the resist layer is demonstrated. In this method, the thermoplastic resist layer is pressed by a mold at room temperature, without heating or any surface treatment of either the mold or the resist. This method has the unique features of enabling step-and-repeat and multiple imprinting.

UR - https://www.scopus.com/pages/publications/0035902004

U2 - 10.1002/1521-4095(200105)13:10<749::AID-ADMA749>3.0.CO;2-7

DO - 10.1002/1521-4095(200105)13:10<749::AID-ADMA749>3.0.CO;2-7

M3 - Article

AN - SCOPUS:0035902004

SN - 0935-9648

VL - 13

SP - 749

EP - 752

JO - Advanced Materials

JF - Advanced Materials

IS - 10

ER -

Room-temperature imprint lithography

Abstract

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