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Selective SiO2/Si3N4 etching in magnetized inductively coupled C4F8 plasma

  • Ho Jun Lee
  • , Joong Kyun Kim
  • , Jung Hun Kim
  • , Ki Woong Whang
  • , Jeong Ho Kim
  • , Jung Hoon Joo
  • Seoul National University
  • Kyoto University
  • SK Corporation
  • Kunsan National University

Research output: Contribution to journal › Article › peer-review

7 Scopus citations

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