Self-boosted tunnel field-effect transistor using nitride charge trapping layer for low supply voltage operation

Tunneling field-effect transistors (TFETs) have been studied as a candidate for low-power device due to the remarkable subthreshold characteristics. However, digital circuits composed of TFET have significantly large propagation delay compared with the conventional MOSFET circuits because of small current drivability and large gate-to-drain capacitance. In this work, the electrical characteristics of the self-boosted TFETs with nitride charge trapping layer have been studied using TCAD simulations. Trapped charges in the nitride layer improve subthreshold characteristics and on-current (I_ON) of both nTFET and pTFET during gate bias sweep. In addition, the benefits of the self-boosted TFET devices to low supply voltage system application are investigated. Energy consumption and propagation delay of both conventional and self-boosted TFET inverters are compared by the mixed-mode circuit simulation study. Energy consumption is almost same but the propagation delay of the self-boosted TFET inverter is reduced especially for ultra-low voltage operation where system delay is increased dramatically.