TY - GEN
T1 - Stacked chip-to-chip interconnections using wafer bonding technology with dielectric bonding glues
AU - Lü, J. Q.
AU - Kwon, Y.
AU - Kraft, R. P.
AU - Gutmann, R. J.
AU - McDonald, J. F.
AU - Gale, T. S.
N1 - Publisher Copyright:
© 2000 IEEE.
PY - 2001
Y1 - 2001
N2 - Three-dimensional (3D) interconnects offer the potential of reducing fabrication and performance limitations of future generations of planar ICs. This paper describes a specific approach, incorporating wafer alignment and wafer bonding of two 200-mm silicon wafers, along with subsequent processing steps. Our approach using dielectrics as the bonding glue layer provides a monolithic 3D interconnect process, which is fully compatible with back-end-of-the-line processing. This 3D technology enables heterogeneous systems, such as future electronic and photonic systems using a mix-and-match hard IP core design approach, and provides a high-density pin-out alternative to stacked chip-scale packages today.
AB - Three-dimensional (3D) interconnects offer the potential of reducing fabrication and performance limitations of future generations of planar ICs. This paper describes a specific approach, incorporating wafer alignment and wafer bonding of two 200-mm silicon wafers, along with subsequent processing steps. Our approach using dielectrics as the bonding glue layer provides a monolithic 3D interconnect process, which is fully compatible with back-end-of-the-line processing. This 3D technology enables heterogeneous systems, such as future electronic and photonic systems using a mix-and-match hard IP core design approach, and provides a high-density pin-out alternative to stacked chip-scale packages today.
UR - https://www.scopus.com/pages/publications/85001133965
U2 - 10.1109/IITC.2001.930066
DO - 10.1109/IITC.2001.930066
M3 - Conference contribution
AN - SCOPUS:85001133965
T3 - Proceedings of the IEEE 2001 International Interconnect Technology Conference, IITC 2001
SP - 219
EP - 221
BT - Proceedings of the IEEE 2001 International Interconnect Technology Conference, IITC 2001
PB - Institute of Electrical and Electronics Engineers Inc.
T2 - IEEE International Interconnect Technology Conference, IITC 2001
Y2 - 4 June 2001 through 6 June 2001
ER -