Study on the resistive switching time of TiO2 thin films

  • Byunq Joon Choi
  • , Seol Choi
  • , Kyunq Min Kim
  • , Yong Cheol Shin
  • , Cheol Seong Hwang
  • , Sung Yeon Hwang
  • , Sung Sil Cho
  • , Sanghyun Park
  • , Suk Kyoung Hong

Research output: Contribution to journalArticlepeer-review

119 Scopus citations

Abstract

The required time for voltage-pulse-induced resistive switching of 40-nm-thick TiO2 thin films integrated in a contact-type structure (Pt top and TiN bottom contact, contact area ∼0.07 μm2) was studied as a function of pulse voltage. For off → on switching at least 2 V was necessary and the minimum switching times were ∼20 ns at 2 V and ∼10 ns at 3 V. For on → off switching, a minimum switching time of 5 μs was obtained at 2.5 V. The resistance of the on-state device was also dependent on the switching voltage and time.

Original languageEnglish
Article number012906
JournalApplied Physics Letters
Volume89
Issue number1
DOIs
StatePublished - 2006

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