Ta segregation at the TiC(0 0 1) surface studied by time-of-flight impact-collision ion scattering spectroscopy

Yeon Hwang, Ryutaro Souda, Shunichi Hishita, Shigeki Otani

Research output: Contribution to journalArticlepeer-review

1 Scopus citations

Abstract

Tantalum was ion implanted onto the TiC(0 0 1) surface at the energy of 2 MeV with the total doping amount of 1 × 1017 atoms/cm2. After thermal treatment at 1600 °C for 300 s, the atomic structure of Ta segregation on the TiC(001) surface was investigated by using time-of-flight impact-collision ion scattering spectroscopy (TOF-ICISS). It was found that the segregated Ta atoms were located on the Ti-site. Ta atoms segregated not only to the outermost layer but had a gradual concentration decrease inwards from the surface.

Original languageEnglish
Pages (from-to)555-558
Number of pages4
JournalNuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms
Volume184
Issue number4
DOIs
StatePublished - Dec 2001

Keywords

  • Impact-collision ion scattering spectroscopy
  • Surface segregation
  • Titanium carbide

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