Wafer bonding using dielectric polymer thin films in 3D integration

Y. Kwon, J. Q. Lu, R. P. Kraft, J. F. McDonald, R. J. Gutmann, T. S. Cale

Research output: Contribution to journalConference articlepeer-review

11 Scopus citations

Abstract

A key process in our approach to monolithic three-dimensional (3D) integration is the bonding of 200-mm wafers using dielectric polymer thin films as bonding glues. After discussing the desired properties of polymer thin films, we describe how bonding protocols are evaluated using silicon and glass wafers. After bonding, the fraction of bonded area was inspected optically and a razor blade method was used to indicate bonding strength. Thermal stability and bonding integrity were evaluated using thermal cycling and backside grinding and polishing. To date, we have studied benzocyclobutene (BCB), Flare™, and methylsilsesquioxane (MSSQ) and Parylene-N as bonding glues. Wafer pairs bonded using BCB showed a larger fraction of bonded area, and those using Flare indicated higher thermal stability. Both BCB and Flare glues provided good bonding integrity after backside grinding tests. Changes in the chemical structures of BCB and Flare glue during bonding were analyzed using FTIR in order to understand the bonding mechanism and to improve the bonding process.

Original languageEnglish
Pages (from-to)231-236
Number of pages6
JournalMaterials Research Society Symposium - Proceedings
Volume710
StatePublished - 2002
EventPolymer Interfaces and Thin Films - Boston, MA, United States
Duration: 26 Nov 200130 Nov 2001

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